900 Series In Line Sputtering System.
Load-lock chamber with CTI On-board cryo pump
Main process chamber with CTI On-board cryo pump.
Three DC magnetron target assemblies.
Target 1: Ti material, MU Inset cathode
Target 2: Au material, UPSILON Inset cathode, single piece
Target 3: TiW, MU Inset cathode
AE MDX 10kW DC sputtering power supply.
RF Sputter Etch Station with AE RFG 1250 RF generator w/ auto tune matching network.
Single process gas, MFC calibrated 100 sccm Ar.
Polycold compressor with water pump in process chamber.
Computer control system for on-button operation.
208V, 3 Ph, 50/60 Hz.
Company: Semicore Equipment Inc Contact Name: Matthew Hughes Status:Premium Member
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