Posted by:

tescal

Location:

California

Ad Status:

New!

Manufacturer:

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Model:

Year (or range of years):

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Description:

Three cathode, load lock, sputter down type system.

* Stainless steel process chamber fully shielded.

* Stainless steel load-lock chamber.

* Table drive assembly with a precision motor for rotation.

* Sputtering top head assembly can accommodate up to three Delta type cathodes or with adapter plates other types of cathodes.

* RF and DC magnetron cathodes are available.

* Substrate table is water cooled and can be biased for RF etch or biased during the sputtering deposition process.

* MFC gas flow control system.

* One (1) each 1 torr full scale capacitance manometer.

* Substrate heating can be offered as an option.

* Process chamber is pumped by model CTI-8 Cryo pump and compressor.

* Mechanical pump.

* System will have new pneumatics.

* System will have new plumbing and flow sensors.

* System will have new safety system.

* System will have new seals and o-rings.

* Full set of manuals.

* Demonstration, training and maintenance CD with video and audio instruction.

* Spare parts list.

* Optional turbo pumped Load lock is available.