CVC 601 Sputtering System

Posted by:

tescal

Location:

California

Ad Status:

Closed

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Model:

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Description:

Four cathode, load lock, sputter up, batch type system.

The load lock accommodates six 7? diameter titanium substrate holders.

Low volume load lock (1.7cu. ft.). The substrate transfer mechanism is manually operated.

25? diameter by 7? high water cooled Process chamber with four 8? diameter cathode positions.

Rotostrate substrate carousel with controller.

RF and DC magnetron cathodes are available.

Three (3) MKS mass flow controllers (MFC)

One (1) MKS model 247 four channel readout.

One (1) MKS model 250 controller for pressure readout.

One (1) CVC interlock control panel.

One (1) MKS capacitance monometer.

Granville-Phillips model 358 micro ion gauge controller.

CVC model AVC 485 automatic valve controller.

Substrate heating can be offered as an option.

CTI-8 Cryo pump and compressor.
Manual throttle valve.

Mechanical pump.

Power hoist. Complete set of documentation.

Can be configured to suit.

Additional options are available.


Visit our website for more details.