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MATRIX 105 6" Asher, Single wafer, Single cassette, Setup for 3" - 6" wafers. Brooks Wafer Handling System up to 150mm Wafers, Microprocessor Controlled Menu-driven, Multi-step program (three steps + over etch) process program, Range for Strip: 150C to 250C +/-5C, Range for Descum: 70C to 150C +/-5C, Wafer Lift Pin Assembly (up and down), Temperature, gas flow, & substrate position, Low temp processing eliminates thermal damage, Independent control of pressure, Self contained RF power supply, Butterfly" Valve for more precise pressure control. 600W RF water cooled generator, Phase magnitude detector to provide real-time RF impedance matching control. Two Mass Flow Controllers.