High production volume — capability for processing >5 million 156mm sq. POCl3 substrates per year, >2.4 million 156mm sq. PECVD substrates per year and high volume dry oxidation
Designed Specifically for the Solar Industry, incorporates one PECVD ARC tube level, one POCl3 tube level, one dry oxidation tube level and one de-populated tube level
Optional capability for depositing a dual refractive index PECVD nitride film (process included) producing one of the most efficient A/R coatings available
Variable pulse duration 450KHz RF power allows optimizing ARC film characteristics. Dual frequency RF power supplies available
Cantilever auto-loaders on each atmospheric tube level
Compact—<44 ft2 floor space for complete system
PC-controlled for functional capability and ease of operation
HOST computer with color monitor and keyboard/mouse controls
Self Cleaning RF Electrode Design on PECVD process tube level
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Ad Number: 166312
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