LAM Research LRC 4520XL Oxide etch Chamber. Originally installed on LAM Alliance A4 Module. Can be installed on either Alliance A4 or A6. Dual Frequency Advanced Oxide RIE (Reactive Ion Etch) Variable Gap Process pressure 30 - 150mtorr
ESC HGP – Helical Groove Pump Chamber and wafer area manometers Helium backside cooling Up to 8 Gases
Globak Fab Surplus Semiconductor Equipment LLC, GFAB
Company: Global Fab Surplus Semiconductor Equipment LLC Contact Name: David Lee Status:Premium Member
adid=112147
onClick='enterWindow=window.open("/favorits.php?adid=112147","Favorites","width=400,height=200,top=200,left=200"); return false'
onmouseover="window.status='Put this Ad in My Favorites'; return true;"
onmouseout="window.status=''; return true;">
Ad Number: 112147
About this Lam research LRC 4520XL listing - This is a for sale classified ad for a used, surplus or second hand Lam research LRC 4520XL equipment. It is posted by one of our members. To contact the seller of this item please click the WebMail icon at the bottom of this Lam research LRC 4520XL listing or view this user's member profile for detailed contact info.
:92/0
