Gasonics dual chamber etcher used to independently deskin (remove a crusted layer of photoresist without penetrating a lower layer of conventional photoresist) or to independently remove photoresist. Tool can also be used in a two step process: deskin a wafer and in a second step perform a conventional as removal. The tool operates while simultaneously producing microwave energy and rf energy.
For additional specs and photos, please refer to our website:
www.photonicmicrodevices.com
Company: Photonic Microdevices Inc. Contact Name: Roland Levy Status:Premium Member
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