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Gasonics is a Registered Trademark of Novellus Corp. Gasonics Aura 2000LL is a 8" Cassette to Cassette ,Single Wafer Downstream Microwave Asher w/ Loadlock with microwave source and a dictated reactor chamber ,8" Cassette to Cassette ,Single Wafer Asher ,Configured for 4" - 8" wafers,Loadlock with cool-down station for processed wafer Gas box, designed to hold 4 MFC's capability (System includes 2 MFC's calibrated to customer gas specifications Downstream endpoint detection Rear access with control panel for servicing .No RF damage (0.1 VOLT CV SHIFT) Front and backside etching .Variable platen temperature Alumina (ceramic) Plasma Tube Fluorine compatible chamber Multiple step process capability.
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In semiconductor manufacturing plasma asher/stripper is the process of removing the photoresist from an etched wafer. Using a plasma source, a monatomic reactive species is generated. Oxygen or fluorine are the most common reactive species. The reactive species combines with the photoresist to form ashing which is removed with a vacuum pump.
Typically, monatomic (single atom) oxygen plasma is created by exposing oxygen gas (O2) to ionizing radiation. At the same time, many free radicals are formed which could damage the wafer. Newer, smaller circuitry is increasingly susceptible to these particles. Originally, plasma was generated in the process chamber, but as the need to get rid of free radicals has increased, many machines now use a downstream plasma configuration, where plasma is formed remotely and channeled to the wafer. This allows electrically charged particles time to recombine before they reach the wafer surface, and prevents damage to the wafer surface.
Monatomic oxygen is electrically neutral and although it does recombine during the channeling, it does so at a slower rate than the positively or negatively charged free radicals, which attract one another. Effectively, this means that when all of the free radicals have recombined, there is still a portion of the active species available for process. Because a large portion of the active specie is lost to recombination, process times may take longer. To some extent, these longer process times can be mitigated by increasing the temperature of the reaction area.
Allwin21 Corp can provide the following refurbished plasma asher/descum equipment.
Refurbished Matrix 105
Refurbished Matrix 205
Refurbished Matrix 10
Refurbished Gasonics Aura 1000
Refurbished Gasonics Aura 2000
Refurbished Gasonics Aura 3010
Refurbished Gasonics L3510
Refurbished Branson IPC 3000
Refurbished Branson IPC L3200
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