Reference id: 5225
Manufacturer: PLASMOS
Model: SD 4000
Type: Ellipsometer
Condition: good
Vintage: Jul 1993
Sales Condition: as is where is
Quantity: 1
Comments: Serial number 5072.07.93 Installed: March 1994 110/220 V single phase 50/60 Hz supply, titling stage, autoloader,manuals. stage can tilt from 55 to 73 degrees. -Philips 14 inch monitor and TEL 9M200A-15 inch video monitor -2 lasers -200 mm xy stage -Illuminator Leica KL 1500 Electronic -Electrophysics AF 750 Microscope autofocus system. -Boat of 8 inch test wafers -PC control unit with windows software -Dimensions 95 x 164 x 164 cm Missing robot Z-coupling The SD 4000 is a fully automated advanced production Ellipsometer for thin and thick film measurement. This High Throughput Production Ellipsometer operates according to the RAE (Rotating Analyser Ellipsometer) principle. Equipped with several precise lasers the system is a leader in precision and accuracy. The small micro spot and the high precision xy - stage enables the system to measure in very small structures on 'in-line' product wafers (Discrete wavelengths of 632.8nm and 1550nm ). Multiple wavelength measurements extending into the IR region enable the measurement of multiple layer stacks including both poly and amorphous silicon layers. For ease of operation the system is equipped with a dual magnification microscope, a superior pattern recognition system and powerful software. The PLASMOS SD 4000 Universal Thickness Measurement System is capable of providing thickness and refractive index measurements of transparent and semi transparent films over the entire required thickness range of semiconductor processes from a few Angstroms to several micrometers for single layer as well as multilayer films. The fully automated handler, wafer orientation, auto focusing and pattern recognition minimise the human influence and result in low defect levels, low scrap rate and stable measurement results. The tool is easy to operate and has a high throughput rate. The high accuracy and precision meet the requirements for today's and future semiconductor processes. With all the above qualities we will meet our technical requirements in a very economical way. Typical Application: Determination of optical properties of thin films, dielectrics, semiconductors, metals, high-TC superconductors, silicium oxide and silicium nitride layer characterization
Company: SDI Semiconductor Instruments Group Contact Name: Stephen Howe Status:Premium Member
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