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Unit Information:
Part Number: 3156024-105
Power Requirements: 200 - 230 V ~, 50/60 Hz, 1.4 kW
Typical Applications:
# Plasma Etching/Deposition
# Reactive Ion Etching
# RF Sputtering
# DC Sputtering with RF Bias
General Description:
The PDX plasma generator supplies 500 W maximum power at 325 to 375 kHz. It provides fully integrated instrumentation and load matching. The RF output is sinusoidal and, at full-rated power, all harmonics are 45 dB below the fundamental output frequency. The PDX is well suited to chemical vapor deposition (CVD), etching, dielectric sputtering, and plasma polymer applications where precise control of power is mandatory to optimize electrical moding, specific specie production, control of stress, and gas transport interactions.
The PDX power-conversion technique stores virtually no energy at the output, and, with proper system shielding techniques, produces little EMI/RFI. The PDX is equipped with a standard internal power line filter.
The PDX arc-suppression circuit turns off RF power in less than 2 µs. This fast response, combined with the very low stored energy at the output, eliminates direct damage and particulate contamination.
The PDX operates continuously into a load mismatch range without harm or oscillation; in such cases load power is reduced.
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