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Upgraded AG Heatpulse 8108 for Sale
[long word] Upgraded AG 8108 Key Features:
AG Heatpulse 8108 Series are single-wafer, cassette-to-cassette rapid thermal processors, capable of processing in inert or corrosive ambient. The unit is built for the production environment. AG8108 is a rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity, AW Control Software and Superior Temperature Control Technology provide significant advantages over conventional furnace processing and conventional RTP systems
Wafer Size 4?, 5?, 6?, 8?
Robot control ability. (Equip Tech. robot with one arm)
Single Wafer Process.
Gold coated aluminum chamber with water cooling
Radiation heating lamp module
8-gas channel with 4 MFCs
Cassette to cassette wafer handling
Precise Temperature/Time control, Temperature measuring precision+/-1C.
Multiple cycle processing capability
Steady Temp Range: 600C to 1250C for pyrometer sensor, 100C to 600C for Thermocouple.
Steady state process time 0 to 30000 sec programmable.
Temp Ramp-up Speed: 10C to 120C for wafer. Programmable
Ramp down speed 10C - 150C for wafer
Robot wafer cycling: 80 Wafers/Hr.
New hardware includes: three interface cards with cable, new timer counter with watch dog, Pentium Computer with 17? LCD Monitor, standard keyboard and mouse.
Software calibration and easy to be done.
More functions and I/O hardware ?exposed? for easier maintenance and trouble shooting.
It is easy to edit recipe with GUI and graph display.
Save all process data on the computer hard disk.
A/D and D/A precision is 14 to 16 bits.
Detect in process and with color curve displayed on the screen.
Robot teach is on the GUI and easy to do the procedure with new concept teaching method.
Lamp damage detect in process.
Software watch dog to eliminate machine damage duo to the computer locks up or freeze.
Sensor status detect function.
On line help function.
High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies.
Consistent wafer-to-wafer process cycle repeatability.
Elimination of external contamination.
Small footprint and energy efficiency.
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