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serial number 0904-0098-0995 CE marked Each systems contains two process modules, p/n 909000-301 and one control module.
The Excalibur* vapor phase processor is a single wafer processor for cleaning and etching. It uses HF as a cleaner and an etchant.To simplify clean and rinse operations, the system uses an in-situ'rinse (ISR) system.The excalibur is bnot normally used for removal of base wafer material, rather it is used as a cleaner for a subsequent process step.It's purpose is the removal of oxides or contaminant residues left or formed on the wafer as a result of some process step.It is used to promote better film adhesion during subsequent process steps.Typical process applications are after RIE wafer cleaning or cleaning prior to gate formation, polysilicon deposition,silicide layer deposition,contact metal deposition or epitaxial layer deposition..The last cleaning step is always HF, which has been shown to reduce residual metal contamination.
Anhydrous HF is used as a cleaning agent mixed with various amounts of N2 that has been moisturized by passing it through a vapor chamber containing deionized water.By careful control of the amount of moisturized N2 mixed with the HF, etch rate can be controlled in a range from 5 to 200 Angstroms/se. The Excalibur is completely computer controlled; therefore wafer contamination risks are reduced.
An Excalibur ISR consists of a control console and at least one ISR process module.
The Control Console consists of a power conditioner, a power supply, a power distribution and breaker box, a personal computer that provides the operator and maintenance interface and to run the control software, a second remote monitor and remotekeyboard, digital input and output circuitry for monitoring and control of the system, analog I/O circuitry for control and monitoring of the variable functions of the wafer processor.
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